Tempress Systems TS-6303 Reference Manual

8, DESCRIPTION 2.Description 2.1 Diffusion system The Furnace is designed to perform Diffusion/Atmospheric and Low Pressure Chemical Vapor Deposition (LPCVD) processing on wafers from 75 mm up to 300 mm, and may be installed in a cleanroom environment. The furnace is housed in a ut…

26, START-UP 4.5 Installation of the Quartz Tube Follow the procedure as described below for installing a Quartz Tube: • Unpack the quartz tube and inspect for any type of damage. If any damage is visible, then... (for further information, see item 3.2). • Clean th…

36, MAINTENANCE • Remove straps and power cables from the heating element • Lift the heating element from the support and remove it carefully. • Place the new element and follow the instructions, as described above, in reverse and adjust the heating element. After the adjust…

32, START-UP UNLOAD WAFERS In this step the system waits for the operator to unload the wafers. A sonalert alarm will sound. When unloading is done press <START>. After reaching the END command of the profile process recipe, the recipe will return to step 0, the safe…

27, Tempress Systems TS-6303 START-UP • Check if there are any gaps between the process tube and the tube adapters and between the radiation shield and the quartz tube. If there are gaps, fill them up with heat resisted insulating material, such as quartz wool. • Push the thermocouple back, till …

44, TROUBLE SHOOTING 7.Trouble Shooting PROBLEM: POSSIBLE CAUSE AND SOLUTION (-S): 1. Excess Temperature alarm: • Thermocouple break (one of the LED’s will be lighted). • Setpoint of the Excess Temperature is lower then the setpoint of the Temperature Controller. �…